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Keynote Speaker

Nolwenn Fleurence

Laboratoire National de Métrologie et d'Essais, France

E-mail

nolwenn.fleurence@lne.fr

Thermal characterization at the micro- and nanoscale

Nolwenn Fleurence, Sarah Douri, Alexandra Delvallée, Lydia Chibane, Nicolas Feltin
Laboratoire National de Métrologie et d'Essais (LNE), 29 avenue Roger Hennequin, 78197 Trappes Cedex - France

The development of miniaturized electronic devices relies heavily on the use of thin films and nanomaterials such as nanowires, 1D and 2D materials. To address the thermal management issues that appear in this new generation of electronic components, the semiconductor industry requires reliable thermal properties measurements at the nanoscale. Scanning Thermal Microscopy (SThM) is emerging as a powerful Atomic Force Microscope (AFM) based microscopy method for thermal contrast mapping and investigating thermal properties at the nanoscale using dedicated calibration protocols.

This talk will provide an overview of our recent work to qualify SThM measurements from a metrological perspective. Our approach aims to investigate the strengths and weaknesses of SThM measurements in terms of sensitivity range, spatial resolution, measurement artefacts, and instrumentation improvements. We will also discuss potential development paths to further improve the reliability or even the traceability of SThM measurements, such as optimized calibration protocols or the use of correlative microscopy.

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